Comment on “quantum interferometric optical lithography: Exploiting entanglement to beat the diffraction limit”

$Comment on “quantum interferometric optical lithography: Exploiting entanglement to beat the diffraction limit”$

Journal article

Peer reviewed

G.S. Agarwal, R.W. Boyd, E.M. Nagasako and S.J. Bentley

Physical review letters, Vol.86(7), pp.1389-1389

2001

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Title: Comment on “quantum interferometric optical lithography: Exploiting entanglement to beat the diffraction limit”
Creators: G.S. Agarwal - Physical Research Laboratory
R.W. Boyd - University of Rochester
E.M. Nagasako - University of Rochester
S.J. Bentley - University of Rochester
Publication Details: Physical review letters, Vol.86(7), pp.1389-1389
Academic Unit: Adelphi University; College of Arts and Sciences; Physics
Resource Type: Journal article
DOI: https://doi.org/10.1103/PhysRevLett.86.1389
Record Identifier: 991004358899106266