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Arbitrary 2-D pattern formation beyond the rayleigh limit
Conference proceeding

Arbitrary 2-D pattern formation beyond the rayleigh limit

S.J. Bentley
Optics InfoBase Conference Papers
2007/Laser Science XXIII/Organic Materials and Devices for Displays and Energy Conversion (San Jose, California United States, 09/16/2007 - 09/20/2007)
2007
DOI: https://doi.org/10.1364/fio.2007.fwc1

Abstract

Photolithography Photons Two-dimensional materials
A relatively simple new technique to generate arbitrary two-dimensional patterns in a multi-photon absorber with resolution exceeding the Rayleigh limit has been developed. This four-beam interference technique could greatly extend photolithography capabilities.
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